文章摘要
248nm 光刻胶用丙烯酸酯共聚物的合成与性能
Synthesis of Methacrylic Copolymers Applied in 248nm Photoresist
  
DOI:10.16865/j.cnki.1000-7555.2017.11.001
中文关键词: 248nm  共聚物  光刻胶  分辨率
英文关键词: 248 nm  copolymer  photoresist  resolution
基金项目:国家重大科技专项(2010ZX02304);江苏省产学研前瞻性联合研究项目(BY2015019-14);中央高校基本科研业务费专项资金(JUSRP11514)
作者单位
徐文佳1, 郑祥飞1, 纪昌炜1, 刘敬成1, 刘 仁1, 穆启道2, 刘晓亚1 1.江南大学化学与材料工程学院,江苏 无锡 214122; 2.苏州瑞红电子化学品有限公司,江苏 苏州 215124 
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中文摘要:
      以对乙酰氧基苯乙烯(ASM)、丙烯酸叔丁酯(TBA)、丙烯酸四氢呋喃酯(TA)和2-甲基-2-金刚烷基甲基丙烯酸酯(MAM)为单体,偶氮二异丁腈(AIBN)为引发剂,通过自由基聚合制备了不同MAM 含量的丙烯酸酯类共聚物P(ASMco-TBA-co-TA-co-MAM)(PATTM),加入一定量的甲醇钠和甲醇进行醇解,制得丙烯酸酯类共聚物PATTM-A。用傅里叶变换红外光谱、核磁共振氢谱、凝胶渗透色谱、差示扫描量热法等方法对共聚物PATTM 和PATTM-A 的结构与性能进行了表征;以PATTM-A为基体树脂配制了光刻胶,利用扫描电子显微镜测试了光刻胶分辨率。结果表明,随着MAM 含量升高,PATTM-A的相对分子质量下降,玻璃化转变温度升高,耐碱性增强,所制备的光刻胶分辨率可达0.5μm。
英文摘要:
      A series of methacrylic copolymer P(ASM-co-TBA-co-TA-co-MAM) (PATTM) with different ratios of 2-methyl-2-adamantyl methacrylate(MAM) were synthesized by reaction of p-acetoxystyrene (ASM), tert-butyl acrylate (TBA), tetrahydrofurfuryl acrylate(TA)and 2-methyl-2-adamantyl methacrylate (MAM) via free radical copolymerization, then a photosensitive copolymer PATTM-A was prepared by reaction of PATTM and sodium methoxide solution. Fourier transform infrared spectroscopy (FT-IR), nuclear magnetic resonance spectroscopy (1H-NMR), gel permeation chromatography (GPC) and differential scanning calorimetry (DSC) were used to characterize the structure and properties of copolymers. The results show that the molecular weight decreases while the glass transition temperature of copolymer increases with increase of the MAM content. Photoresists based on PATTM-A were prepared, for which the resolution can reach 0.5 μm, hardness and adhesion are good.
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